EUV lithography

March 19, 2015 | 0 Comment

Current status of EUV lithography

It is undeniable that extreme ultra-violet lithography has progressed in an extraordinary way in the last 12 months. Until recently, it was not commonly agreed upon in the lithography industry whether EUV litho would have made it to full production … Continue reading […]

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Electrical Energy Through Body Movements

February 12, 2015 | 0 Comment

Human Patch to Generate Electrical Energy Through Body Movements

Using the static electricity from human skin to generate enough energy for electronic devices which require little power – a group of researchers from National University of Singapore (NUS) presented this idea during the IEEE MEMS 2015 conference with a … Continue reading […]

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Laser Sputter Deposition

October 28, 2014 | 0 Comment

Laser Sputter Deposition

Laser sputter deposition is a thin film deposition technique for silicon wafers, which uses high-energy pulsed laser radiation to ablate or knock-off target molecules and deposit them as a thin film layer on a wafer substrate. This technique was first … Continue reading […]

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Cluster Beam Formation

September 19, 2014 | 0 Comment

Common Cluster Beam Formation Techniques

Cluster ion beam is a deposition process where high quality films are formed through clusters of electrically charged ions. In IC manufacturing, cluster ion beam is used for film formation of dielectric and other wafer layers at low substrate temperature. … Continue reading […]

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Cluster Ions

September 1, 2014 | 0 Comment

Common Techniques Used to Form Cluster Ions

Due to their high catalytic activity in solutions as well as their usefulness in preparation of dispersed metal catalysts, clusters, also known as colloids, had been a very important aspect in science since its discovery in 18th century. A cluster … Continue reading […]

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EUV lithography

August 4, 2014 | 0 Comment

IBM’s EUV System Exceeds Target Output at 637 Wafers / Day

IBM has recently reported that their latest ASML extreme ultraviolet (EUV) lithography scanner system, NXE3300B, has produced 637 wafers in its first 24 hours of operation using a 44 watt light source at a rate of 34 wafers per hour, … Continue reading […]

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Vacuum Chucks

August 2, 2014 | 0 Comment

An Introduction to Vacuum Chucks

Each step on wafer processing such as mounting the wafer on the probe card during wafer test,  or holding it while it is being rotated during  photo resist coating,  involves wafer handling and transfer. To be able to perform efficiently … Continue reading […]

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Chemical Vapor Deposition

July 24, 2014 | 0 Comment

Deposition Rate of Chemical Vapor Deposition

Chemical Vapor Deposition (CVD) is the process used to deposit thin film of solid material in various applications like fabrications of novel powder, fiber, preforms of ceramic composites, coatings for corrosion and wear resistance, and synthetic diamond. It is the … Continue reading […]

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July 16, 2014 | 0 Comment

Porous vacuum chucks – types of chucks

Types of porous vacuum chucks Several types of porous vacuum chucks are available today on the market: cylindrical porous chucks, push-up table porous chucks, heater table porous chucks, built-in heater porous chucks among others. Different applications require different types of … Continue reading […]

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Gigaphoton making progress with both EUV and 450mm-wafer lithography technology

July 13, 2014 | 0 Comment

Gigaphoton’s EUV Light Source Advances to 92 Watts Output at 4.5 CE

Gigaphoton Inc. has recently announced that they were able to produce a light output for extreme ultraviolet (EUV) lithography scanners with more than twice of the amount they had three months ago. From the 43 watts at 2.4 conversion efficiency … Continue reading […]

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