Physical vapor deposition through sputtering

February 2, 2014 | 0 Comment

PVD (physical vapor deposition) through sputtering

Sputtering is one of the methods by which physical vapor deposition (PVD) is achieved. PVD is a process where a thin film of material is deposited on the surface of a substrate. In sputter deposition, high-energy particles are utilized to … Continue reading […]

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patterned sapphire substrate

January 14, 2014 | 0 Comment

Variants of nano imprint lithography

In addition to the above mentioned thermal and UV-nano imprint lithography, there a big number of variety of processes about nanoimprint that have flourished in recent years, such as laser assisted direct imprint, Sub-10 nm NIL, combined thermal and UV … Continue reading […]

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Nanoimprint mold - microlens array pattern 3

December 23, 2013 | 2 Comments

The two main categories of nanoimprinting

While there are many different flavours of nanoimprinting processes, two main ones are: Thermal nanoimprinting (also called as hot embossing) UV-nanoimprinting Thermal nanoimprint technology Thermal nanoimprint technology has been the first kind of nanoimprinting process ever used and the original … Continue reading […]

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Nanoimprint resin film molds

December 8, 2013 | 2 Comments

Virtual interview about nanoimprinting lithography and its current applications

Q: Let` s start to discuss about the current situation of nanoimprint technology and how do you see it as of now. There were a lot of expectations behind nanoimprint a few years ago, do you think nanoimprinting lithography has … Continue reading […]

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Holes array nanoimprint molds

December 1, 2013 | 0 Comment

Introduction to nano imprint lithography

Nano imprint (or nanoimprint) lithography, abbreviated as NIL, is a relatively old patterning technology which has gained traction in the last few years. Nano imprint technology was introduced back in 1996 by Prof. Chou as an alternative fabrication method to … Continue reading […]

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