Chemical Vapor Deposition

July 11, 2014 | 0 Comment

Reaction Mechanisms of Chemical Vapor Deposition

Chemical vapor deposition (CVD) is a process used to grow a film of solid material by transporting a chemical precursor in its vapor phase and decomposing it through heat. Typically, a material in its solid form is vaporized and diluted … Continue reading […]

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Mercury-arc lamp

July 3, 2014 | 0 Comment

Principles of Light Sources for Lithography

It has been proven that the design lenses which images near the diffraction are limited only over narrow bandwidths in wavelength. This is a consequence of the phenomenon of dispersion where index of refraction changes with the wavelength of the … Continue reading […]

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July 2, 2014 | 0 Comment

Light Sources Used in Photolithography

Lithography comes from the Greek words lithos, which means ‘stone’, and graphein, which means ‘to write’.  It is the process used to print by transferring a mirror image of the pattern from the flat surface. It was developed in 1976 … Continue reading […]

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Graphene is an hexagonal honeycomb lattice

June 24, 2014 | 0 Comment

Graphene: the basics

With a thickness of only one atom and weighing around 0.77 milligrams per square meter, Graphene is one of the strongest materials known to man, with a breaking strength of 100 to 300 times greater than steel, and one of … Continue reading […]

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June 19, 2014 | 0 Comment

HP working on “The machine”, a new computer architecture based on silicon photonics and memristors

In the last few decades, several times companies and research organizations have proposed potentially disrupting innovations in the semiconductor arena, but almost all the times the Intel steamroller crushed them. Transputers, innovative RISC architectures, clock-less chips and other technologies that … Continue reading […]

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June 18, 2014 | 0 Comment

Photolithography, how does it work?

Photolithography is one of the main parts of the microprocessor manufacturing steps. There are currently three types of photolithography processes: contact alignment photolithography, proximity alignment photolithography, projection or stepper lithography. Contact alignment lithography is the simplest and involves a light … Continue reading […]

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Molecular beam epitaxy (MBE)

June 16, 2014 | 0 Comment

Molecular beam epitaxy

Molecular beam epitaxy (MBE), a technique used to form an epitaxial growth, is very often used in semiconductor industry as deposition method of thin films on wafer substrates due to its efficiency, controlled doping characteristic, repeatability, and uniformity. But before … Continue reading […]

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Physical vapor deposition through sputtering

June 15, 2014 | 0 Comment

PVD: Sputtering and Thermal Evaporation

Any wafer fabrication involves deposition of layers of materials, which will serve as a conductor, an insulator, or a buffer. Thin film metal layers like aluminum interconnects are deposited in the wafer substrate through Physical Vapor Deposition (PVD) – a … Continue reading […]

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Physical vapor deposition through sputtering

May 29, 2014 | 0 Comment

The evolution of physical vapor deposition technology from thermal evaporation to sputtering

Sputtering deposition is one of the main physical vapor deposition techniques to deposit thin films of metals or other materials over a substrate. The technique is useful for microelectronics applications and has been widely popular in the industry for several … Continue reading […]

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Apple and Samsung - the top of OEMs in semiconductor

May 13, 2014 | 0 Comment

Apple and Samsung were at the top of OEMs in semiconductor spending for 2013 and likely to stay within the leading group in 2014 as well

A report from IHS Technology released a couple of months ago revealed that Samsung and Apple were the top buyers of semiconductor chips in 2013 among the leading original equipment manufacturers (OEMs). Myson Robles-Bruce, senior analyst for semiconductor spend and … Continue reading […]

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