Sputtering deposition service and sputtering targets
Martini Tech offers thin film deposition sputtering services for a large number of sputtered materials and with wafer sizes up to 8 inches (for some materials it is possible to sputter up to 12-inch wafers).
Martini Tech thin film deposition sputtering service is of high quality and usually performed quickly and at low cost: we currently have available five RF magnetron sputtering machines.
Particular services such as sputtering of SiO2 and sputtering of rare-earth materials are also available.
Martini Tech also offers you sputtering targets with more than 120 sputtered materials available and sputtering target bonding services.
Our sputter deposition technology has many advantages such as the availability of a wide range of different target materials, a high-speed sputter deposition process and a very uniform thin film.
Martini Tech thin film deposition sputtering service is of high quality and usually performed quickly and at low cost: we currently have available five RF magnetron sputtering machines.
Particular services such as sputtering of SiO2 and sputtering of rare-earth materials are also available.
Martini Tech also offers you sputtering targets with more than 120 sputtered materials available and sputtering target bonding services.
Our sputter deposition technology has many advantages such as the availability of a wide range of different target materials, a high-speed sputter deposition process and a very uniform thin film.
For SiO2 sputtering services, please check here
For GaN MOCVD deposition services, please check here
Thin film deposition services
Thin film fabrication technology is used for wide range of applications in the semiconductor, photovoltaic and other markets and for creating anti-sticking layers for nanoimprint molds or other applications. Martini Tech has access to various deposition technologies such as sputter coating, evaporation, CVD among others to offer you contract thin film manufacturing services.
Using our experience in the field, we offer many different types of thin film fabrication processes and deposition services to meet our customers` requirements from small-scale to large-scale production.
Using our experience in the field, we offer many different types of thin film fabrication processes and deposition services to meet our customers` requirements from small-scale to large-scale production.
Please feel free to contact us for further information.
Available sputtering targets
METAL SPUTTERING | up to Φ3 | up to Φ4 | up to Φ8 |
Au | ![]() |
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Al | ![]() |
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Ag | ![]() |
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B | ![]() |
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- |
Bi | ![]() |
- | - |
C | ![]() |
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- |
Co | ![]() |
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Cr | ![]() |
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Cu | ![]() |
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Fe | ![]() |
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Ge | ![]() |
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- |
Hf | ![]() |
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- |
In | ![]() |
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- |
Ir | ![]() |
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- |
Mg | ![]() |
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- |
Mo | ![]() |
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Nb | ![]() |
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- |
Ni | ![]() |
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Pb | ![]() |
- | - |
Pd | ![]() |
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- |
Pt | ![]() |
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- |
Rh | ![]() |
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- |
Ru | ![]() |
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- |
Si(N) | ![]() |
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- |
Si(P) | ![]() |
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Si(Non-Doped) | ![]() |
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- |
Sn | ![]() |
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- |
Ta | ![]() |
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Ti | ![]() |
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V | ![]() |
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- |
W | ![]() |
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Zn | ![]() |
- | - |
Zr | ![]() |
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- |
Size is referred to target
SILICIDE SPUTTERING | up to Φ3 | up to Φ4 | up to Φ8 |
CoSi2 | ![]() |
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CrSi2 | ![]() |
- | - |
MoSi2.5 | ![]() |
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- |
NiSi2 | ![]() |
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- |
TaSi2 | ![]() |
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- |
TiSi2 | ![]() |
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WSi0.4 | ![]() |
- | - |
WSi2 | ![]() |
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WSi2.5 | ![]() |
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- |
ZrSi2 | ![]() |
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- |
Size is referred to target
NITRIDE SPUTTERING | up to Φ3 | up to Φ4 | up to Φ8 |
AIN | ![]() |
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- |
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BN | ![]() |
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- |
Cr2N | ![]() |
- | - |
Mo2N | ![]() |
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- |
Si3N4 | ![]() |
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TiN | ![]() |
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- |
ZrN | ![]() |
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- |
Size is referred to target
ALLOY SPUTTERING | up to Φ3 | up to Φ4 | up to Φ8 |
Al-Cu | ![]() |
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Al-Nd | ![]() |
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- |
Al-Sc | ![]() |
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- |
Al-Si | ![]() |
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Al-Si-Cu | ![]() |
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Al-Ti | ![]() |
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- |
Cu-Cr | ![]() |
- | - |
Cu-Cr | ![]() |
- | - |
Cu-Cr | ![]() |
- | - |
Cu-Ni | ![]() |
- | - |
Cu-Ni | ![]() |
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Co-Cr | ![]() |
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- |
Co-Ni | ![]() |
- | - |
Ni-Cr | ![]() |
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- |
Ni-Cr-Si | ![]() |
- | - |
Ni-Cr-Si | ![]() |
- | - |
Ni-Fe | ![]() |
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- |
TiW | ![]() |
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Size is referred to target
OTHERS | up to Φ3 | up to Φ4 | up to Φ8 |
Corning #1737 | ![]() |
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- |
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Sialon | ![]() |
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- |
Sendust | ![]() |
- | - |
Teflon | ![]() |
- | - |
Pyrex | ![]() |
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BK7 | ![]() |
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- |
CaF | ![]() |
- | - |
CaF2 | ![]() |
- | - |
MgF2 | ![]() |
- | - |
Size is referred to target