Nanoimprint

Martini Tech

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Molecular beam epitaxy (MBE)

Introduction to nano imprint lithography

Nano imprint (or nanoimprint) lithography, abbreviated as NIL, is a relatively old patterning technology which has gained traction in the last few years.
Nano imprint technology was introduced back in 1996 by Prof. Chou as an alternative fabrication method to traditional optical lithography. … Continue reading […]

Molecular beam epitaxy (MBE)

The two main categories of nanoimprinting

While there are many different flavours of nanoimprinting processes, two main ones are:

Molecular beam epitaxy (MBE)

Variants of nano imprint lithography

In addition to the above mentioned thermal and UV-nano imprint lithography, there a big number of variety of processes about nanoimprint that have flourished in recent years, such as laser assisted direct imprint, Sub-10 nm NIL, combined thermal and UV nanoimprint, electrical field-assisted NIL, soft UV-NIL, reverse NIL, Jet and Flash imprint lithography process … Continue reading […]