Thin film deposition techniques for MEMS processing
One of the fundamental steps in microelectromechanical systems (MEMS) processing is the deposition of thin films of material with thicknesses ranging from a few nanometers to about 100 micrometers.
Deposition techniques in MEMS processing fall into two categories, the first being techniques that deposit a thin film based on chemical reactions. These include chemical vapor deposition (CVD), epitaxy, thermal oxidation, and electrodeposition. … Continue reading […]
How to sputter indium gallium nitride at low temperatures
One of the fundamental steps in microelectromechanical systems (MEMS) processing is the deposition of thin films of material with thicknesses ranging from a few nanometers to about 100 micrometers.
Deposition techniques in MEMS processing fall into two categories, the first being techniques that deposit a thin film based on chemical reactions. These include chemical vapor deposition (CVD), epitaxy, thermal oxidation, and electrodeposition. … Continue reading […]