One of the fundamental steps in microelectromechanical systems (MEMS) processing is the deposition of thin films of material with thicknesses ranging from a few nanometers to about 100 micrometers. Deposition techniques in MEMS processing fall into two categories, the first … Continue reading → […]

Sputtering is one of the methods by which physical vapor deposition (PVD) is achieved. PVD is a process where a thin film of material is deposited on the surface of a substrate. In sputter deposition, high-energy particles are utilized to … Continue reading → […]

In addition to the above mentioned thermal and UV-nanoimprint, there a big number of variety of processes about nanoimprint that have flourished in recent years, such as laser assisted direct imprint, Sub-10 nm NIL, combined thermal and UV nanoimprint, electrical … Continue reading → […]

While there are many different flavours of nanoimprint processes, two main ones are: thermal nanoimprint (also called as hot embossing) and UV-nanoimprint Thermal nanoimprint has been the first kind of nanoimprint process ever used and the original one adopted by … Continue reading → […]

Q: Let` s start to discuss about the current situation of nanoimprint technology and how do you see it as of now. There were a lot of expectations behind nanoimprint a few years ago, do you think nanoimprint has delivered … Continue reading → […]

Nano imprint (or nanoimprint) lithography, abbreviated as NIL, is a relatively old patterning technology which has gained traction in the last few years. Nano imprint technology was introduced back in 1996 by Prof. Chuo as an alternative fabrication method to … Continue reading → […]